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Influence of Photoactivation Source on Restorative Materials and Enamel Demineralization

机译:光活化源对修复材料和牙釉质脱矿质的影响

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摘要

>Objective: The objective of this study was to evaluate the influence of the photoactivation source on the polymerization depth of restorative materials and its effects on resistance to enamel demineralization. >Background data: Argon-ion laser (AL) irradiation itself provides a reduced depth of caries lesions in sound enamel. >Methods: Eighteen human teeth were sectioned into 36 blocks and distributed into two groups according to the respective restorative material: resin-modified glass ionomer material (RMGI) (Vitremer-3M ESPE; A3; n=18) and composite resin (CR) (Z350-3M ESPE; n=18). Each group was subdivided into three subgroups and activated by a quartz-tungsten-halogen (QTH) lamp, an AL, or a light-emitting diode (LED) (n=6). Knoop microhardness (KHN) analysis of the materials was evaluated at two different depths: 0 and 1.6 mm from the enamel surface. The blocks were thermocycled and submitted to five demineralization–remineralization cycles at 37°C. The KHN values of the enamel surface (0 mm) were evaluated. The specimens were longitudinally sectioned, and the restorative material was evaluated at a depth of 1.6 mm. Data were evaluated by two way analysis of variance (ANOVA) and Tukey tests (p<0.05). The evaluation of subsuperficial enamel demineralization by KHN analysis was conducted by seven indentations located at 100 μm from the restored cavity. Data were evaluated by three way ANOVA and Tukey tests (p<0.05). >Results: Comparing the two restorative materials, the KHN values at the surface (0 mm) were greater for CR, whereas at 1.6 mm, they were greater for RMGI. In addition, there was less development of enamel demineralization around RMGI restorations than CR restorations. Moreover, there were statistically significant differences on subsuperficial enamel demineralization between the two restorative materials and between the three photoactivation methods (p<0.05); RMGI presented the highest KHN values, and QTH and AL presented the lowest. >Conclusions: The photoactivation source did not influence superficial enamel demineralization, but LED activation positively influenced the subsuperficial microhardness of enamel.
机译:>目的:本研究的目的是评估光活化源对修复材料聚合深度的影响及其对牙釉质脱矿性的影响。 >背景数据:氩离子激光(AL)辐射本身可降低声音搪瓷中龋齿病变的深度。 >方法:根据相应的修复材料:树脂改性的玻璃离聚物材料(RMGI)(Vitremer-3M ESPE; A3; n = 18),将18颗人类牙齿切成36块,分成两组。以及复合树脂(CR)(Z350-3M ESPE; n = 18)。将每个组细分为三个子组,并通过石英钨卤素灯(QTH),AL或发光二极管(LED)激活(n = 6)。材料的努氏显微硬度(KHN)分析在两个不同的深度进行评估:距搪瓷表面0和1.6?mm。将这些块进行热循环,并在37°C下进行五个脱盐-再矿化循环。评价搪瓷表面的KHN值(0(mm)。将样品纵向切开,并在1.6mm的深度评估修复材料。数据通过方差分析(ANOVA)和Tukey检验(p <0.05)进行双向评估。用KHN分析法对浅表釉质脱矿质进行评估,方法是在距修复腔100μm处的七个压痕处进行。数据通过三因素方差分析和Tukey检验进行评估(p <0.05)。 >结果:比较两种修复材料,CR的表面KHN值(0 Kmm)较大,而RMGI的KHN值在1.6 mm处更大。此外,RMGI修复体周围牙釉质脱矿的发展少于CR修复体。此外,两种修复材料之间以及三种光活化方法之间的浅表釉质脱矿有统计学差异(p <0.05); RMGI给出了最高的KHN值,而QTH和AL给出了最低的KHN值。 >结论:光活化源不影响表面釉质的脱矿质,但是LED活化对釉质的表面下显微硬度有积极的影响。

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