Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films

Bernd Gruska; Dieter Schmei#223; er; Franziska Naumann; Hassan Gargouri; J#246; rg Haeberle; Karsten Henkel; Massimo Tallarida; Michael Arens

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Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films

机译：热和等离子体增强原子层沉积的Al2O3膜的椭偏和XPS比较研究

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《Beilstein Journal of Nanotechnology》 |2013年第1期|共页
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Bernd Gruska; Dieter Schmei#223; er; Franziska Naumann; Hassan Gargouri; J#246; rg Haeberle; Karsten Henkel; Massimo Tallarida; Michael Arens;
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2. Plasma-enhanced atomic layer-deposited La_2O_3 ultra-thin films on Si and 6H-SiC: a comparative study [J] . Khushabu S. Agrawal, Viral N. Barhate, Vilas S. Patil, Applied Physics . 2020,第8期

机译：Si和6h-SiC上的等离子体增强原子层沉积的LA_2O_3超薄薄膜：比较研究
3. Comparative study of structural electrical dielectric and ferroelectric properties of HfO_2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET [J] . Rajesh Kumar Jha, Prashant Singh, Manish Goswami, Journal of materials science . 2019,第23期

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4. Comparative Study on Structural and Electrical Characteristics of TiO_2 Film Deposited by Plasma-Enhanced Atomic Layer Deposition and RF Sputtering [C] . Rajesh Kumar Jha, Prashant Singh, Manish Goswami, International conference on VLSI, communication, and signal processing . 2020

机译：等离子体增强原子层沉积沉积的TiO_2薄膜结构和电特性的比较研究及RF溅射
5. Interface Electronic State Characterization of Plasma Enhanced Atomic Layer Deposited Dielectrics on GaN. [D] . Yang, Jialing. 2014

机译：GaN上等离子增强原子层沉积介电层的界面电子状态表征。
6. Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films [O] . Jörg Haeberle, Karsten Henkel, Hassan Gargouri, 2013

机译：热和等离子体增强原子层沉积的Al2O3膜的椭偏和XPS比较研究
7. Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al₂O₃-films [O] . Jörg Haeberle, Karsten Henkel, Hassan Gargouri, 2013

机译：椭偏仪和Xps比较研究热和等离子体增强原子层沉积al _{2 O _{3 -films}}

Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films

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