Microstructure and oxidation behavior of a Ni plus CrAlYSiHfN/AlN multilayer coating fabricated by reactive magnetron sputtering

摘要

A multilayer coating, about 40 mu m thick, was prepared on superalloy Rene N5 by reactive sputtering from a NiCrAlYHfSi target and an Al target. The as-deposited coating comprised alternating gamma-Ni+CrN+hcp-AlN layers, about 300 nm thick, and hcp-AlN + Al layers, about 400 nm thick. XRD analysis showed that CrN and Al disappeared and beta-NiAl was formed in the coating after annealing at 1000 degrees C. The multilayer coating exhibited good oxidation resistance by forming thin and adherent alumina scales at 1050 degrees C and 1100 degrees C, and better spallation resistance of oxide scale than sputtered NiCrAlYHfSi coating. (C) 2015 Elsevier Ltd. All rights reserved.