The hardnesses and elastic moduli of pulsed laser deposited multilayer AlN/TiN thin films

摘要

The hardnesses and elastic moduli of multiple aluminum nitride (AlN) and titanium nitride (TiN) thin film bilayers of various periodicities deposited on silicon (lll) and sapphire (000l) were investigated using nanoindentation based on a continuous stiffness measurement technique. Multiple bilayer thin films of AlN/TiN were grown by the pulsed laser deposition method. X-ray diffraction analysis revealed that the deposited thin films were highly textured polycrystalline oriented along the [000l] and [lll] axes for aluminum nitride and titanium nitride, respectively. The AlN/TiN multiple layer hardness measurements ranged from l8 to 23 GPa, compared to single component film hardnesses of 34 and 24 GPa for TiN and AlN, respectively. The elastic moduli measured were 290-340 and 275-290 GPa for multiple layer AlN/TiN thin films deposited on sapphire (000l) and silicon (lll), respectively.