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Performance Analysis of Double EWMA Controller Under Dynamic Models With Drift

机译:带有漂移的动态模型下双EWMA控制器的性能分析

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摘要

This paper mainly focuses on the performance of the double exponentially weighted moving average (DEWMA) controller applied to a first-order dynamic input–output model with process drift. Under a general process disturbance, based on Jury test, the necessary and sufficient conditions involving model parameters, the estimated process gain, and weighting factors are established to ensure that the closed-loop system is asymptotically stable. In addition, we explore why we should use the DEWMA controller to adjust the process rather than the single exponentially weighted moving average controller when the process drifts considerably. Later, under the stability condition, the control performance analysis of the closed-loop system is performed in terms of the asymptotical variation and the transient deviation. Then, an optimization model is established to figure out the appropriate weighting factors for reducing the overall variation of the process output during the process of operation. Finally, extensive simulations are carried out to demonstrate the validity of the theoretical analysis in the context of chemical mechanical polishing process.
机译:本文主要关注双指数加权移动平均(DEWMA)控制器的性能,该控制器应用于具有过程漂移的一阶动态输入-输出模型。在一般过程扰动下,基于Jury测试,建立了包含模型参数,估计过程增益和加权因子的充要条件,以确保闭环系统渐近稳定。此外,我们探讨了当过程发生明显漂移时,为什么应该使用DEWMA控制器来调整过程,而不是使用单个指数加权移动平均值控制器来进行调整。随后,在稳定状态下,根据无症状变化和瞬态偏差对闭环系统进行控制性能分析。然后,建立优化模型以找出适当的加权因子,以减少操作过程中过程输出的总体变化。最后,进行了广泛的仿真,以证明理论分析在化学机械抛光过程中的有效性。

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