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Enhancement of on-chip combustion via nanoporous silicon microchannels

机译:通过纳米多孔硅微通道增强片上燃烧

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Due to its high energy density and MEMS compatible fabrication methods, on-chip porous silicon shows considerable promise as an energetic material. Rapid combustion events have been demonstrated with flame propagation speeds eclipsing 3 km/s, but much is still unknown about the controlling parameters of porous silicon combustion. Recent studies show that implementation of microstructure within a nanoporous silicon film greatly increases reaction rate of a relatively slow burning system. The present work utilizes porous silicon microchannels to enhance an already rapidly-reacting system. Reactions in channeled porous silicon regions of this system propagated at speeds up to 1.2 km/s faster than similar neat porous silicon films. The fastest propagation speed was 3660 m/s, the highest reported flame speed for comparable nanoenergetic systems to date. We provide evidence that the enhancement of flame propagation rates by channeled porous silicon is mechanistically different from the convectively controlled burning of neat porous silicon. This evidence suggests the presence of acoustically aided reactions for porous silicon channel combustion where the channels more readily ignite compared to neat porous silicon. We predict this allows for propagation of the reaction by intense sound waves within the porous medium.
机译:由于其高能量密度和与MEMS兼容的制造方法,片上多孔硅有望成为一种高能材料。火焰传播速度超过3 km / s时已证明了快速燃烧事件,但是多孔硅燃烧的控制参数仍然未知。最近的研究表明,在纳米多孔硅膜内实施微结构可大大提高相对缓慢燃烧系统的反应速率。本工作利用多孔硅微通道来增强已经快速反应的系统。与类似的纯净多孔硅膜相比,该系统的带通道多孔硅区域中的反应传播速度高达1.2 km / s。最快的传播速度为3660 m / s,是迄今为止可比的纳米能量系统报告的最高火焰速度。我们提供的证据表明,通道化多孔硅对火焰传播速率的增强与纯多孔硅对流控制燃烧的机理不同。该证据表明存在用于多孔硅通道燃烧的助听反应,与纯净多孔硅相比,该通道更容易点燃。我们预测这将使反应通过强声波在多孔介质中传播。

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