METHOD FOR COMBUSTION CHEMICAL VAPOR DEPOSITION TO ENHANCE CORROSION RESISITANCE OF SILICON OXIDE FLIM

摘要

A CCVD(Combustion Chemical Vapor Deposition) method that can enhance corrosion resistance of the metal surface by densely forming a silicon oxide film on a metal surface by using CCVD techniques is provided. In a combustion chemical vapor deposition method for transferring a vapor phase of a precursor to a burner by a carrier gas and depositing the vapor phase of the precursor onto a substrate by a flame of combustion heat, a combustion chemical vapor deposition method of a silicon oxide film with excellent corrosion resistance comprises: controlling the injection ratio of an oxidation gas to a combustion gas to a range of 10:190 to 10:210 to secure the combustion heat in the burner; using HMDSO(hexamethyldisiloxane), and controlling the injection amount ratio of the carrier gas containing the vapor phase of the precursor to the oxidation gas to a range of 210:0.8 to 210:2.4; and adjusting the distance from the burner to the substrate to less than 10 mm, thereby depositing the vapor phase of the precursor onto the substrate in a blue bright zone of the flame, wherein the silicon oxide film has a deposition coating thickness of 4 to 35 nm.