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首页> 外文期刊>Circuits, Devices & Systems, IET >Analytical modelling of tantalum/titanium oxide-based multi-layer selector to eliminate sneak path current in RRAM arrays
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Analytical modelling of tantalum/titanium oxide-based multi-layer selector to eliminate sneak path current in RRAM arrays

机译:钽/氧化钛基多层选择器的分析建模,消除RRAM阵列中潜行路径电流

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One selector-one resistor (1S-1R) configuration is desirable to use in conductive bridge resistive random-access memory (CBRAM) and resistive random-access memory (RRAM) crossbar arrays (CBAs) to reduce sneak path current. In this study, an analytical model of Ta2O5/TaOx/TiO2 selector device is developed and is integrated with RRAM model to demonstrate the acquired features of 1S-1R to reduce the sneak path current. The proposed selector model is developed by considering the electric field-driven tunnelling mechanisms co-exist in thin multi-layer devices such as direct and Fowler-Nordheim tunnelling. The simulated characteristics of proposed model shows high non-linearity (similar to 1600), high selectivity (similar to 10(4)), high current density (similar to 10(7) A/cm(2)) and low off current (similar to 46 nA). Further, the proposed model is simulated with different top electrode metals and dielectric materials to demonstrate the formation of optimal stack for the desired application. Then, the proposed selector model (1S) is integrated with RRAM model (1R) and the compatibility of the devices is verified. Moreover, from the presented 1S-1R model, various parameters for the establishment of CBA such as read/write voltages for selected/unselected trails are predicted and substantial conditions for sneak path current reduction such as non-linearity, Roff/Ron ratio and off-current (10 nA) are also evaluated.
机译:一个选择器 - 一个电阻器(1S-1R)配置是希望在导电桥电阻随机存取存储器(CBRAM)和电阻随机存取存储器(RRAM)交叉阵列(CBA)中用于减少潜行路径电流。在这项研究中,开发了TA2O5 / Taox / TiO2选择器装置的分析模型,并与RRAM模型集成,以演示1S-1R的获取功能,以减少潜行路径电流。所提出的选择器模型是通过考虑电场驱动的隧道机制而开发的,例如直接和福勒 - 诺德海姆隧道的薄多层装置中共存。建议模型的模拟特性显示出高的非线性(类似于1600),选择性高(类似于10(4)),电流密度高(类似于10(7)A / CM(2))和低电平电流(类似于46 NA)。此外,所提出的模型用不同的顶电极金属和介电材料模拟,以证明所需应用的最佳堆叠的形成。然后,所提出的选择器模型(1S)与RRAM模型(1R)集成,验证了设备的兼容性。此外,从所呈现的1S-1R模型,预测用于建立CBA的各种参数,例如所选/未选择的路径的读/写电压,并且用于潜行路径电流减少的实质条件,例如非线性,罗夫/ ron比和关闭 - 还评估了电流(10A)。

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