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Design Techniques for a 30-ns Access Time 1.5-V 200-KB Embedded EEPROM Memory

机译:30 ns访问时间的设计技术1.5 V 200 KB嵌入式EEPROM存储器

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摘要

A 200-KB embedded electrically erasable programmable READ-only memory (EEPROM), which operates with a single 1.5-V power supply voltage based on an HHGRACE (Shanghai Huahong Grace Semiconductor Manufacturing Corporation) 90-nm EEPROM process, is developed. In this brief, several key design techniques are presented. An improved bit cell with a larger current sensing window is adopted in the split-source EEPROM array. To get high-speed READ operation, a high-performance sense amplifier and a dynamic sensing window tracking reference voltage generating circuit have been proposed. The die size of the proposed EEPROM IP is 1.271 mm2, and the EEPROM cell size is 0.32 μm2. Access time of 30 ns is achieved at 1.5 V and 25 °C.
机译:开发了一个200 KB嵌入式电可擦可编程只读存储器(EEPROM),该存储器基于HHGRACE(上海华虹格雷斯半导体制造公司)的90 nm EEPROM工艺以1.5V的单电源电压工作。在本简介中,介绍了几种关键的设计技术。在分离源EEPROM阵列中采用具有较大电流感测窗口的改进位单元。为了获得高速READ操作,已经提出了高性能感测放大器和动态感测窗口跟踪参考电压产生电路。拟议的EEPROM IP的芯片尺寸为1.271 mm2,EEPROM单元尺寸为0.32μm2。在1.5 V和25°C时达到30 ns的访问时间。

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  • 作者单位

    State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, University of Chinese Academy of Sciences, Shanghai Huahong Grace Semiconductor Manufacturing Corporation, Shanghai, Beijing, Shanghai, ChinaChinaChina;

    Shanghai Huahong Grace Semiconductor Manufacturing Corporation, Shanghai, China;

    Shanghai Huahong Grace Semiconductor Manufacturing Corporation, Shanghai, China;

    Shanghai Huahong Grace Semiconductor Manufacturing Corporation, Shanghai, China;

    Shanghai Huahong Grace Semiconductor Manufacturing Corporation, Shanghai, China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    EPROM; Computer architecture; Sensors; Microprocessors; Nonvolatile memory; Transistors;

    机译:EPROM;计算机体系结构;传感器;微处理器;非易失性存储器;晶体管;

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