...
首页> 外文期刊>Circuitree >Fine Lines in High Yield (Part CXXVIII): HDI Trends and Developments
【24h】

Fine Lines in High Yield (Part CXXVIII): HDI Trends and Developments

机译:高产细线(CXXVIII部分):HDI趋势和发展

获取原文
获取原文并翻译 | 示例

摘要

Traditional HDI (high density interconnect) structures feature microvias in so-called build-up layers. The microvias in adjacent build-up layers are off-set, or "staggered." Coreless structures, such as the ALIVH process can form staggered as well as "stacked" microvias. In addition to the ALIVH stacked microvia structures (Matsushita, see Figure 1), there are other stacked microvia processes such as the PALAP process (Denso, see Figure 2) and the FVSS process (Ibiden, see Figure 3) that are gaining traction in commercial applications. The ALIVH process has been a long-time favorite in Japanese cell phone boards.
机译:传统的HDI(高密度互连)结构在所谓的堆积层中具有微孔。相邻堆积层中的微孔偏移或“交错”。无芯结构(例如ALIVH工艺)可以形成交错的微孔,也可以形成“堆叠的”微孔。除了ALIVH堆叠的微孔结构(松下,见图1)之外,还有其他堆叠的微孔工艺,例如PALAP流程(Denso,见图2)和FVSS流程(Ibiden,见图3)也越来越受到关注。商业应用。长期以来,ALIVH工艺一直是日本手机主板中的首选。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号