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Fine Lines in High Yield (Part CXXV): Fine Lines-Beyond the Limits of Semi-Additive Processing?

机译:高产量的细线(CXXV部分):细线是否超出半加成工艺的极限?

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The finest circuitry in electronic packaging is found in the build-up microvia layers of IC packages. These circuits are formed by semi-additive processing (SAP, see Figure 1) which means a resist pattern is formed on top of very thin electroless copper, the circuits are then plated up, resist is stripped, and the base copper is "differential etched." This etching is done without a metal-etch resist to protect the plated copper and therefore some of the plated copper is lost as well. This means the resist pattern has to compensate for this etch-back. To form 10μm lines and spaces, the resist dimensions may be more like 8μm wide resist lines and 12μm resist spaces, because the etching of the 0.5 to 1μm thin base copper will etch-back at least 1μm from both sides of the plated line.
机译:电子封装中最好的电路位于IC封装的微孔层中。这些电路是通过半加成工艺(SAP,请参见图1)形成的,这意味着在非常薄的化学铜上形成抗蚀剂图案,然后电镀电路,剥除抗蚀剂,然后对基础铜进行“差分蚀刻” 。”在没有金属抗蚀剂来保护镀铜的情况下进行该蚀刻,因此一些镀铜也丢失了。这意味着抗蚀剂图案必须补偿这种回蚀。要形成10μm的线和间距,抗蚀剂的尺寸可能更像8μm宽的抗蚀剂线和12μm的抗蚀剂间距,因为蚀刻0.5至1μm的薄基底铜将从蚀刻线的两侧至少回蚀1μm。

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