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Mesmoproc - implementation of a maskless electrochemical surface modification process

机译:Mesmoproc-无掩模电化学表面改性工艺的实施

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摘要

The conventional processes used to fabricate microscale interconnections, devices and components use photoresists and a range of developing, etching and stripping chemicals to produce the requisite shapes and features in a process known as photolithography. In conventional production approaches, a photolithography stage is required to pattern each individual substrate. Currently, PCB boards (PCBs) are manufactured by using a copper coated board which is coated with a photosensitive etch resist material. This is typically in the form of a so-called dry film resist, although liquid materials are also sometimes used. Although there are several approaches that can be used to form subsequent patterns and features, etc. a commonly used method requires the resist to be cured by exposing it to ultra violet light through a mask. A pattern is then formed in the resist by removing the material in the unexposed areas. This process is known as development. In PCB board applications, additional copper may then be plated on top of the thin copper coating as required. Once the copper has been plated, the resist is then removed entirely using a range of chemical stripping solutions. Next, the exposed copper is removed using a variety of etching solutions, which are typically very corrosive. This process, therefore, requires multiple steps to create a metallic pattern on a substrate and also involves many chemicals which are all removed. In addition, PCB manufacturing is carried out in tanks where the circuit board and counter-electrode are often placed at some distance from each other, which in some applications increases the energy requirements of the process and reduces the overall efficiency. This is partially due to the use of standard tank designs and efforts to incorporate electrolyte agitation schemes such as eductors and stirrers, which necessitate a large gap between the electrodes. Many of the electrolytes used in PCB fabrication are strongly acidic corrosive agents that have associated health, safety and environmental concerns. PCB manufacturing, therefore, remains an expensive, multistep process involving specialised equipment and infrastructure which generates copious waste and that consumes large amounts of energy, thereby raising operational costs. Due to increasing cost and sustainability issues, as well as growing social and environmental concerns, many companies using photolithography are keen to implement more efficient alternative approaches. One such alternative is to use a maskless approach known as Enface which obviates the need for individual photolithography stages.
机译:用于制造微型互连,器件和组件的常规工艺使用光刻胶以及一系列显影,蚀刻和剥离化学药品,以在称为光刻的工艺中产生所需的形状和特征。在常规的生产方法中,需要光刻阶段以对每个单独的基板进行构图。当前,PCB板(PCB)通过使用涂覆有光敏抗蚀剂材料的铜涂覆板来制造。尽管有时也使用液体材料,但是通常以所谓的干膜抗蚀剂的形式。尽管有几种方法可以用来形成后续的图案和特征等,但是一种常用的方法需要通过将抗蚀剂通过掩模暴露在紫外线下来固化抗蚀剂。然后通过去除未曝光区域中的材料在抗蚀剂中形成图案。此过程称为开发。在PCB板应用中,可以根据需要在薄铜涂层的顶部镀覆额外的铜。镀铜后,然后使用一系列化学剥离溶液将抗蚀剂完全去除。接下来,使用通常非常腐蚀性的各种蚀刻溶液去除裸露的铜。因此,该过程需要多个步骤以在基板上形成金属图案,并且还涉及许多被全部去除的化学物质。另外,PCB制造是在通常将电路板和反电极彼此隔开一定距离的容器中进行的,这在某些应用中会增加过程的能源需求并降低整体效率。部分原因是由于使用了标准的水箱设计,并且努力整合了电解质搅拌方案,例如喷射器和搅拌器,这需要在电极之间留出较大的间隙。 PCB制造中使用的许多电解质都是强酸性腐蚀剂,具有健康,安全和环境方面的问题。因此,PCB制造仍然是昂贵的,多步骤的过程,涉及专门的设备和基础设施,这会产生大量的废物并消耗大量的能量,从而提高了运营成本。由于成本和可持续性问题的增加,以及对社会和环境问题的日益关注,许多使用光刻技术的公司都渴望实施更有效的替代方法。一种这样的替代方案是使用被称为Enface的无掩模方法,该方法无需单独的光刻步骤。

著录项

  • 来源
    《Circuit World》 |2013年第2期|103-104|共2页
  • 作者

    Martin Goosey; Sudipta Roy;

  • 作者单位

    MTG Research Ltd, Dolanog, UK;

    Royenface Ltd, Newcastle, UK;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 01:17:29

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