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Optical properties of ZnO thin films on SiO_2 substrates deposited by radio frequency magnetron sputtering

机译:射频磁控溅射在SiO_2衬底上ZnO薄膜的光学性质

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摘要

The optical properties of both the annealed and as-deposited ZnO thin films by radio frequency (RF) magnetron sputtering on SiO_2 substrates were studied. In the annealed films, two pronounced well defined exciton absorption peaks for the A and B excitons were obtained in the absorption spectra, a strong free exciton emission without deep-level emissions was observed in the photoluminescence (PL) spectra at room temperature. It was found that annealing the films in oxygen dramatically improved the optical properties and the quality of the films.
机译:研究了射频(RF)磁控溅射在SiO_2衬底上退火和沉积后的ZnO薄膜的光学特性。在退火的薄膜中,在吸收光谱中获得了两个明显的A和B激子的清晰的激子吸收峰,在室温下,在光致发光(PL)光谱中观察到了很强的自由激子发射而没有深能级发射。发现在氧气中对膜进行退火大大改善了膜的光学性质和质量。

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