Modification of porous alumina membranes using Al_2O_3 atomic layer controlled deposition

摘要

Al_2O-3 films were deposited with atomic layer control inside the pores of Anodisc alumina membranes. To achieve this controlled deposition on a high aspect ratio structure, a binary reaction for Al_2O-3 chemical vapor deposition (2Al(CH_3)_3 + 3H_2O→Al_2O-3 +6CH_4) was separated into two half-reactions: (A) AlOH +Al(CH_3)_3→Al-O-Al(CH_3)_2 +CH_4 and (B) AlCH_3 +H_2O→AlOH +CH_4, where the asterisks designate the surface species.