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Modification of zeolite or molecular sieve membranes using atomic layer controlled chemical vapor deposition

机译:使用原子层控制的化学气相沉积法改性沸石或分子筛膜

摘要

A process for modifying surfaces of zeolites and molecular sieve membranes to decrease effective pore size for separation of materials includes atomic layer controlled vapor or liquid deposition. The atomic layer controlled deposition process steps include (i) exposing the surface to a metal atom coordinated with ligand groups having bonds that are hydrolyzable to form molecular bonded structures on the surface, which structures comprise the metal atoms coordinated with the ligand group or a modified ligand group and then (ii) hydrolyzing the bonds and possibly, but not necessarily, cross-linking the bonds in the ligand or modified ligand group.
机译:修饰沸石和分子筛膜的表面以减小有效孔径以分离材料的方法包括原子层控制的气相或液相沉积。原子层控制的沉积工艺步骤包括(i)将表面暴露于与配体基团配位的金属原子上,该配体基团具有可水解以在表面上形成分子键合结构的键,该结构包含与配体基团配位的金属原子或改性的配体基团,然后(ii)水解键,并且可能但不一定使配体或修饰的配体基团中的键交联。

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