RECENT PROGRESS IN SYNCHROTRON RADIATION LITHOGRAPHY

摘要

An infrastructure for synchrotron radiation (SR) x-ray lithography has now been completed as a result of dramatic advances in the key components of this technology, including compact SR sources, vertical steppers, x-ray masks, and resist materials. This paper presents NTT's recent progress in SR lithography. The lithographic performance of the integrated system is presented with emphasis on patterning characteristics, overlay and throughput performance, and the feasibility of using SR lithography in the future LSI fabrication is demonstrated.