Synchrotron Light Source and Micro-lithography in Hefei National synchrotron Radiation laboratory

摘要

After taking part in design and construction of the control and beam monitoring system of Hefei National Synchrotron Radiation Light Source, we designed inspection and process control system. With getting storage electron beam and its radiation photon beam characters during the time of storage ring commission, We studied more details of lithography beam line equipment to make sure the right logical relation and performance of each devices on the lithography beam line. So a convenient and smart system had been developed soon after successful storage ring commission. Focussing our attention on safety and reliability, the process control system was composed of monitoring, interlock, data processing, and control. On the other hand, the system has two main parts. One is hardware that includes single piece microcomputers for local process control, Personal microcomputer for main operating process control and others, another is software that has not only a face to the devices of whole beam line and station but also has a face to users. The software will bring a lot of information (datum, figures, graphics, light and voice alarm, and so on) on line for user Some successful soft X-ray lithography sub-micrometer results are achieved by different users in this system, they are showing very good resolution, more clear leakage and enough depth for example.