首页> 外文期刊>Applied Surface Science >Atomic-level mediation in structural interparameter tradeoff of zinc oxide nanowires-based gas sensors: ZnO nanofilm/ZnO nanowire homojunction array
【24h】

Atomic-level mediation in structural interparameter tradeoff of zinc oxide nanowires-based gas sensors: ZnO nanofilm/ZnO nanowire homojunction array

机译:基于氧化锌纳米线的结构互换折衷的原子水平调解 - 基于氧化锌纳米线的气体传感器:ZnO纳米丝/ ZnO纳米线同源阵列

获取原文
获取原文并翻译 | 示例

摘要

The gas response of metal oxide-based gas sensors is determined by atomic scale defects associated with oxygen vacancies and surface area of the sensing element. In this study, we corroborated a facile strategy to manipulate the surface area and the density of oxygen vacancies (OVs) of ZnO nanowires (NWs) simultaneously using atomic layer deposition (ALD)-assisted conformal coating of homogeneous, thickness-tailored ZnO nanofilms. A comprehensive exploration of structural and chemical features of ZnO nanofilms/ZnO NWs homojunction reveals that the surface area and density of OVs can be manipulated by altering the thickness of the ZnO nanofilms. Resistive-type semiconductor gas sensors were fabricated on the thickness-tailored ZnO nanofilms/ZnO NWs homojunction. As a consequence, the optimized gas response values of the ZnO nanofilms/ZnO NWs formed by 50 ALD cycles were estimated to be 84.2% (20 ppm NO2), 45.9% (20 ppm NH3), 35.8% (2% CH4), 29.2% (100 ppm H-2), and 31.2% (2% C3H8). The gas detection limit corresponded to 2 ppm for NO2, 2 ppm for NH3, 10 ppm for H-2, 0.2% for CH4, and 0.2% for C3H8. In addition, we ascertained that the surface area was a critical factor for enhancing the gas response up to 50 ALD cycles, whereas the density of OVs was more critical than the surface area for gas sensing performance with increasing the ALD cycles (50 cycles).
机译:金属氧化物基气体传感器的气体响应由与感测元件的氧空位和表面积相关联的原子垢缺陷确定。在这项研究中,我们使用原子层沉积(ALD)甲型均匀涂层的均匀厚度ZnO纳米岩同时涂覆ZnO纳米线(NWS)的表面积和ZnO纳米线(NWS)的氧空位(OV)的表面积和氧空位(OV)密度。 ZnO Nanofilms / Zno NWS同质局部结构和化学特征的综合探索显示,通过改变ZnO纳米丝的厚度可以操纵表面积和卵巢的密度。在厚度定制的ZnO纳米米螺纹/ ZnO NWS同质上制造电阻型半导体气体传感器。结果,估计由50Ald循环形成的ZnO纳米螺纹/ ZnO NWS的优化气体响应值估计为84.2%(20ppm NO 2),45.9%(20ppm NH 3),35.8%(2%CH4),29.2 %(100ppm H-2)和31.2%(2%C3H8)。气体检测极限对应于NO 2的2ppm,对于NH 3,对于H-2,10ppm的10ppm,对于CH 4的0.2%,C3H8为0.2%。此外,我们确定地表面积是增强高达50 ALD循环的气体响应的关键因素,而OV的密度比增加ALD循环(> 50个循环)的气体传感性能的表面积更为关键。

著录项

  • 来源
    《Applied Surface Science》 |2021年第1期|148350.1-148350.7|共7页
  • 作者单位

    Korea Res Inst Chem Technol Thin Film Mat Res Ctr Daejeon 34114 South Korea|Hongik Univ Dept Mat Sci & Engn Seoul 121791 South Korea;

    Korea Res Inst Chem Technol Thin Film Mat Res Ctr Daejeon 34114 South Korea;

    Korea Res Inst Chem Technol Thin Film Mat Res Ctr Daejeon 34114 South Korea;

    Korea Res Inst Chem Technol Thin Film Mat Res Ctr Daejeon 34114 South Korea;

    Korea Res Inst Chem Technol Chem Data Driven Res Ctr Daejeon 34114 South Korea;

    Korea Res Inst Chem Technol Thin Film Mat Res Ctr Daejeon 34114 South Korea;

    Korea Res Inst Chem Technol Thin Film Mat Res Ctr Daejeon 34114 South Korea;

    Korea Res Inst Chem Technol Thin Film Mat Res Ctr Daejeon 34114 South Korea;

    Korea Res Inst Chem Technol Thin Film Mat Res Ctr Daejeon 34114 South Korea;

    Korea Res Inst Chem Technol Thin Film Mat Res Ctr Daejeon 34114 South Korea;

    Hongik Univ Dept Mat Sci & Engn Seoul 121791 South Korea;

    Korea Res Inst Chem Technol Thin Film Mat Res Ctr Daejeon 34114 South Korea;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Gas response; Atomic layer deposition; ZnO nanowires; Oxygen vacancy; Surface area;

    机译:气体反应;原子层沉积;ZnO纳米线;氧气空位;表面积;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号