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Mutual modulation of F-distribution and N-configuration in F and N dual-functionalized graphene

机译:F和N双功能石墨烯中F分布和N构型的相互调制

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Fluorination and N-doping are two feasible routes to modify the properties of graphene. However, it's difficult to modulate the F-distribution and N-configuration. Here, we found that by the mutual influence between F and N atoms, F-distribution and N-configuration can be facilely modulated. In brief, by annealing F and N dual-functionalized graphene, (i) F-distribution tended to be discrete, and (ii) graphitic N-configuration was progressively converted to pyridinic, and pyridinic to pyrrolic N-configuration. Theoretical calculations indicated that the modulation of F-distribution was due to the adsorptive ability of N atoms, and N-configuration was modulated because F decreased the stability of N-configuration. Furthermore, we found that the mutual modulation of F-distribution and N-configuration could reinforce the radiative recombination of electron-hole pairs, which increased the photoluminescence intensity to 320.69%. This work provides a facile strategy to modulate the distribution and configuration of heteroatoms, broadening the potential applications of dual-functionalized graphene.
机译:氟化和氮掺杂是改变石墨烯性能的两种可行途径。但是,很难调制F分布和N配置。在这里,我们发现,通过F和N原子之间的相互影响,可以轻松地调制F分布和N构型。简而言之,通过使F和N双官能化的石墨烯退火,(i)F分布趋于不连续,(ii)石墨化的N-构型逐渐转化为吡啶基,吡啶基的转变为吡咯N-构型。理论计算表明,F分布的调节是由于N原子的吸附能力引起的,而N构型的调节是由于F降低了N构型的稳定性。此外,我们发现F-分布和N-构型的相互调制可以增强电子-空穴对的辐射复合,从而将光致发光强度提高到320.69%。这项工作提供了一种简便的策略来调节杂原子的分布和构型,从而拓宽了双功能石墨烯的潜在应用。

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