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The surface potential of the Si nanostructure on a Si (111) 7 x 7 surface generated by contact of a cantilever tip

机译:通过悬臂尖端的接触产生的Si(111)7 x 7表面上的Si纳米结构的表面电势

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A Si microstructure on a Si (111) 7 x 7 surface was investigated by a noncontact atomic force microscopy (ncAFM) and a scanning Kelvin probe microscopy (SKPM) in ultra high vacuum. The Si microstructure was generated by intermittent contact of a cantilever tip. It was found by the ncAFM and SKPM observations that the Si mound with a height of 1 Angstrom and a width of 30 nm was generated, and the surface potential of the small mound was 0.1 V lower than that of the 7 x 7 domain. A quenched Si (111) surface was also observed by the ncAFM and SKPM. The differences in height and potential between the reconstructed 7 x 7 and the disordered 1 x 1 domains were about 1 Angstrom and 0.1 V, respectively. Therefore, it was concluded that there appeared the disordered 1 x 1 structure on the surface of the Si small mound, lowering the surface potential by 0.1 V. (C) 2002 Elsevier Science B.V All rights reserved. [References: 20]
机译:通过非接触原子力显微镜(ncAFM)和扫描开尔文探针显微镜(SKPM)在超高真空下研究了Si(111)7 x 7表面上的Si微观结构。通过悬臂尖端的间歇接触产生Si微结构。通过ncAFM和SKPM观察发现,生成了高度为1埃,宽度为30 nm的硅堆,小堆的表面电势比7 x 7域低0.1V。 ncAFM和SKPM也观察到淬火的Si(111)表面。重建的7 x 7和无序的1 x 1域之间的高度和电位差分别约为1埃和0.1V。因此,可以得出结论,在硅小丘的表面上出现了无序的1 x 1结构,使表面电势降低了0.1V。(C)2002 Elsevier Science B.V保留所有权利。 [参考:20]

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