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SIMS depth profiling analysis of electrical arc residues in fire investigation

机译:SIMS火灾调查中电弧残留物的深度剖析分析

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SIMS was used to distinguish the primary and secondary electrical short circuit (ESC) arc beads. A Cs~+ primary ion was used to detect the ~(12)C, ~(63)Cu~-,~(18)O and ~(37)Cl~- secondary ions formed during 0―3 μm depth profiles. Thin surface layer enriched with C, Cl and O was observed in the primary arc beads, whereas a comparably thick layer of Cl was observed in the secondary arc beads at the 0―0.3 μm depth profile. Comparative study of real case samples with those of simulated samples indicates that SIMS can be used as a complementary technique for identification of the cause of fire during fire investigation.
机译:SIMS用于区分一次和二次电短路(ESC)电弧。用Cs〜+初级离子检测在0〜3μm深度剖面中形成的〜(12)C,〜(63)Cu〜-,〜(18)O和〜(37)Cl〜-次级离子。在初级电弧珠中观察到了富含C,Cl和O的薄表面层,而在0-0.3μm深度剖面的次级电弧珠中观察到了相当厚的Cl层。真实案例样本与模拟样本的对比研究表明,SIMS可以用作辅助技术,以在火灾调查过程中识别起火原因。

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