Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching

摘要

A method, combining micro-contact printing (mu LCP), wet chemical etching and reactive ion etching (RIE), is reported to fabricate microstructures on Si and SiOx. Positive and negative structures were generated based on different stamps used for mu CR The reproducibility of the obtained microstructures shows the methodology reported herein could be useful in Micro-Electro-Mechanical Systems (MEMS), optical and biological sensing applications. (c) 2006 Elsevier B.V. All rights reserved.