Function layer microstructuring method, using photochemical etching of outer lacquer layer to reveal chrome protection layer which is etched before microstructuring of underlying function layer

摘要

The microstructuring method uses photochemical etching of outer lacquer layer on at least one side of layer structure incorporating function layer which contains palladium, for revealing underlying chrome protective layer, which is then etched using first etching solution, before microstructuring of function layer via selective chemical etching and final removal of remaining areas of the protective layer via further etching solution.