Glass composition comprises oxides forming fluorides volatile at low temperature, used for producing microstructured components, e.g. micro-arrays, by reactive ion etching

摘要

A glass composition (A) comprises (mol.%): 40-70% silicon dioxide (SiO 2), 0-30% germanium dioxide (GeO 2), 5-20% boron oxide (B 2O 3), 5-20% phosphorus (V) oxide (P 2O 5), 0-10% tungsten (VI) oxide (WO 3), 0-10% arsenic (III) oxide (As 2O 3), 0-5% ytterbium (III) oxide (Yb 2O 3) and 0-5% lutetium (III) oxide (Lu 2O 3). An independent claim is included for the production of (A), by: (1) forming a homogeneous glass melt in a conventional trough of refractory stone or in a platinum or platinum-rhodium crucible; (2) forming a casting or a rolled, drawn or floated glass sheet; and (3) cold post-treating the glass preform to give wafers.