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The p-n junction formation in Hg1-xCdxTe by laser annealing method

机译:Hg1-xCdxTe中激光退火法形成p-n结

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The formation of p-n junctions in Hg1-xCdxTe is still an open research task. In this paper, laser treatment of n-type Ha(1-x)Cd(x)Te samples resulting in the formation of a p-n junction is studied. The YAG:Nd3+ laser with pulse duration of 250 mu s or 40 ns was used. The energy density of laser beam was below the threshold of sample surface melting. The interpretation of the results is based on a model of defects formation related to interstitial mercury diffusion following laser irradiation. The Hall measurements clearly point out to a simple p-n junction. The resistance of samples shows the long time relaxation described by the 1/2 power law, which is attributable to the defect diffusion processes, but not to the changes in the electron-hole systems. (c) 2005 Elsevier B.V. All rights reserved.
机译:Hg1-xCdxTe中p-n结的形成仍是一项开放的研究任务。本文研究了激光处理n型Ha(1-x)Cd(x)Te样品导致形成p-n结的问题。使用脉冲持续时间为250μs或40 ns的YAG:Nd3 +激光器。激光束的能量密度低于样品表面熔化的阈值。结果的解释基于与激光辐照后间隙汞扩散有关的缺陷形成模型。霍尔测量清楚地指出了一个简单的p-n结。样品的电阻显示出1/2幂定律描述的长时间弛豫,这归因于缺陷扩散过程,而不是由于电子-空穴体系的变化。 (c)2005 Elsevier B.V.保留所有权利。

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