机译:晶体取向对LTCC衬底上的AlN薄膜电学性能的影响
Micromechanics, Microfluidics/Microactuators, Faculty of Natural Sciences and Technology II, Saarland University, D-66123 Saarbruecken, Germany,Department for Microsystems Tech-nology, Institute of Sensor and Actuator Systems, Vienna University of Technology, Floragasse 7, A-1040 Vienna, Austria;
Micromechanics, Microfluidics/Microactuators, Faculty of Natural Sciences and Technology II, Saarland University, D-66123 Saarbruecken, Germany;
Micromechanics, Microfluidics/Microactuators, Faculty of Natural Sciences and Technology II, Saarland University, D-66123 Saarbruecken, Germany;
Department for Microsystems Technology, Institute of Sensor and Actuator Systems, Vienna University of Technology, Floragasse 7, A-1040 Vienna, Austria;
A1N; thin film; sputter deposition; conduction mechanism; temperature activation; LTCC substrates;
机译:Nb:SrTiO
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机译:衬底温度和氢稀释比对热线化学气相沉积法生长纳米硅薄膜性能的影响