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Annealing effects on structural, optical and electrical properties of e-beam evaporated CuIn_(0.5)Ga_(0.5)Te_2 thin films

机译:退火对电子束蒸发CuIn_(0.5)Ga_(0.5)Te_2薄膜的结构,光学和电学性质的影响

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CuIn_(o.5)Ga_(o.5)Te_2 (CIGT) thin films have been prepared by e-beam evaporation from a single crystal powder synthesized by direct reaction of constituent elements in a stoichiometric proportion. Post-depositional annealing has been carried out at 300 and 350 ℃. The compositions of the films were determined by energy dispersive X-ray analysis (EDXA) and it was found that there was a remarkable fluctuation in atomic percentage of the constituent elements following to the post-depositional annealing. X-ray diffraction analysis (XRD) has shown that as-grown films were amorphous in nature and turned into polycrystalline structure following to the annealing at 300℃. The main peaks of CuIn_(0.5)Ga_(0.5)Te_2 and some minor peaks belonged to a binary phase Cu_2Te appeared after annealing at 300 ℃, whereas for the films annealed at 350℃ single phase of the CuIn_(0.5)Ga_(0.5)Te_2 chalcopyrite structure was observed with the preferred orientation along the (112) plane. The effect of annealing on and near surface regions has been studied using X-ray photoelectron spectroscopy (XPS). The results indicated that there was a considerable variation in surface composition following to the annealing process. The transmission and reflection measurements have been carried out in the wavelength range of 200-1100 nm. The absorption coefficients of the films were found to be in the order of 10~4 cm~(-1) and optical band gaps were determined as 1.39,1.43 and 1.47 eV for as-grown and films annealed at 300 and 350 ℃, respectively. The temperature dependent conductivity and photoconductivity measurements have been performed in the temperature range of -73 to 157℃ and the room temperature resistivities were found to be around 3.4 × 10~7 and 9.6× 10~6 (Ωcm) for the as-grown and annealed films at 350℃, respectively.
机译:CuIn_(o.5)Ga_(o.5)Te_2(CIGT)薄膜是通过电子束蒸发从单晶粉末中制备的,该单晶粉末是通过化学成分按化学计量比例直接反应合成的。沉积后退火已在300和350℃下进行。通过能量色散X射线分析(EDXA)来确定膜的组成,并且发现在沉积后退火之后,构成元素的原子百分比存在显着的波动。 X射线衍射分析(XRD)表明,成膜后的薄膜本质上是非晶态的,并在300℃退火后变成多晶结构。 CuIn_(0.5)Ga_(0.5)Te_2的主峰和一些较小的峰属于二元相Cu_2Te,在300℃退火后出现,而对于在350℃退火的薄膜,CuIn_(0.5)Ga_(0.5)单相观察到Te_2黄铜矿结构具有沿(112)平面的优选取向。使用X射线光电子能谱(XPS)研究了退火对表面区域及其附近区域的影响。结果表明,在退火过程之后,表面组成有很大的变化。透射和反射测量已在200-1100 nm的波长范围内进行。薄膜的吸收系数大约为10〜4 cm〜(-1),在300和350℃退火时,薄膜的光带隙分别为1.39、1.43和1.47 eV。 。在-73至157℃的温度范围内进行了随温度变化的电导率和光电导率测量,室温和室温下的电阻率分别为3.4×10〜7和9.6×10〜6(Ωcm)。分别在350℃下退火的膜。

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