机译:等离子体增强化学气相沉积法在多孔铝上沉积纳米晶Si(nc-Si)薄膜的结构和光学性质研究
Photovoltaic Laboratory Research and Technology Centre of Energy, Borj-Cedria Science and Technology Park, BP 95,2050 Hammam-Lif, Tunisia;
Photovoltaic Laboratory Research and Technology Centre of Energy, Borj-Cedria Science and Technology Park, BP 95,2050 Hammam-Lif, Tunisia;
Photovoltaic Laboratory Research and Technology Centre of Energy, Borj-Cedria Science and Technology Park, BP 95,2050 Hammam-Lif, Tunisia;
Photovoltaic Laboratory Research and Technology Centre of Energy, Borj-Cedria Science and Technology Park, BP 95,2050 Hammam-Lif, Tunisia;
L3M, Department of Physics, Faculty of Sciences of Bizerte, 7021 Zarzouna, Tunisia;
Photovoltaic Laboratory Research and Technology Centre of Energy, Borj-Cedria Science and Technology Park, BP 95,2050 Hammam-Lif, Tunisia;
Porous aluminum,Nanocrystalline silicon (nc-Si),Ellipsometry,Photoluminescence (PL);
机译:等离子体增强化学气相沉积在多孔铝纳米结构上沉积的纳米晶硅(nc-Si)的形貌和光学性质变化,用于太阳能应用
机译:氢稀释对通过等离子体增强化学气相沉积(PE-CVD)制备的氢化纳米晶硅(nc-Si:H)薄膜的结构,电学和光学性质的影响
机译:等离子体增强化学气相沉积技术沉积四六方多型纳米晶碳化硅薄膜的结构和光学性质
机译:射频偏压对螺旋波等离子体增强化学气相沉积法沉积纳米晶SiC薄膜的光学和结构性能的影响
机译:通过常压金属有机化学气相沉积法沉积的氮化铝薄膜的电,结构和光学性质。
机译:射频等离子体增强化学气相沉积(RF PECVD)反应器中样品高度对氮化硅薄膜光学性能和沉积速率的影响
机译:通过等离子体增强化学气相沉积法沉积的聚萜烯薄膜的光学和化学性质