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Sputtering pressure effects on the structural and mechanical properties of TiVCr alloy coatings

机译:溅射压力对TiVCr合金涂层结构和力学性能的影响

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In this study, TiVCr alloy coatings were deposited on Si substrates by magnetron sputtering system at different working pressures (0.33-1 Pa). The TiVCr coatings have a composite structure with amorphous and body-centered cubic (bcc) crystal phases comprised of bundles of fine fibrous structures and V-shaped columnar structures, respectively. Compared with the amorphous zone, the crystalline zone has a denser and more compact structure. The coating microstructure became more porous as working pressure increased. Consequently, the crystal zones of the deposited coatings at 0.33 Pa obtained higher hardness (11.6 CPa) while the deposited coatings at 1 Pa achieved lower hardness (4.5 CPa).
机译:在这项研究中,TiVCr合金涂层通过磁控溅射系统在不同的工作压力(0.33-1 Pa)下沉积在Si衬底上。 TiVCr涂层的复合结构具有无定形和体心立方(bcc)晶相,分别由成束的细纤维结构和V形柱状结构组成。与非晶区相比,结晶区具有更致密和更紧凑的结构。随着工作压力的增加,涂层的微观结构变得更加多孔。结果,在0.33Pa下沉积的涂层的晶体区获得较高的硬度(11.6CPa),而在1Pa下的沉积涂层获得较低的硬度(4.5CPa)。

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