机译:(CpMe)_3Er前驱体和臭氧在Si(100)上的原子层沉积和化学计量的氧化b薄电介质的表征
Department of Chemical Engineering, University of Illinois at Chicago, Chicago, IL 60607, United States;
Department of Chemical Engineering, University of Illinois at Chicago, Chicago, IL 60607, United States;
Department of Chemical Engineering, University of Illinois at Chicago, Chicago, IL 60607, United States;
Department of Chemical Engineering, University of Illinois at Chicago, Chicago, IL 60607, United States,Department of Bioengineering, University of Illinois at Chicago, Chicago, IL 60607, United States;
atomic layer deposition; erbium oxide; gate dielectric; tris(methylcyclopentadienyl)erbium; ozone;
机译:(CpMe)(3)Er和水前体在原子层沉积中氧化oxide薄膜的高生长速率
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