机译:通过电化学蚀刻在宽波段上具有低反射率的多孔金字塔结构的硅表面
College of Materials Science and Technology, Nanjing University of Aeronautics and Astronautics, 29 Yudao Street, Nanjing 2 WO 16, PR China;
College of Materials Science and Technology, Nanjing University of Aeronautics and Astronautics, 29 Yudao Street, Nanjing 2 WO 16, PR China;
College of Materials Science and Technology, Nanjing University of Aeronautics and Astronautics, 29 Yudao Street, Nanjing 2 WO 16, PR China;
College of Materials Science and Technology, Nanjing University of Aeronautics and Astronautics, 29 Yudao Street, Nanjing 2 WO 16, PR China;
College of Materials Science and Technology, Nanjing University of Aeronautics and Astronautics, 29 Yudao Street, Nanjing 2 WO 16, PR China;
College of Materials Science and Technology, Nanjing University of Aeronautics and Astronautics, 29 Yudao Street, Nanjing 2 WO 16, PR China;
porous-pyramids; reflectance; electrochemical etching; silicon;
机译:自组装的单层岛状掩膜化学蚀刻,用于宽带抗反射硅表面
机译:在不同刻蚀时间下通过电化学刻蚀制备的纳米结构多孔硅的表面和整体结构性质
机译:在不同刻蚀时间下通过电化学刻蚀制备的纳米结构多孔硅的表面和整体结构性质
机译:低反射率的多孔金字塔结构的电化学蚀刻
机译:在感应耦合等离子体反应器中研究碳氟化合物沉积和蚀刻对硅和二氧化硅蚀刻工艺的影响(使用三氟化甲基),并开发了用于研究等离子体与表面相互作用机理的反应离子束系统。
机译:通过污点蚀刻形成纳米结构的硅表面
机译:蚀刻时间对光电化学阳极氧化对p型和n型多孔硅纳米结构表面结构性能的影响