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首页> 外文期刊>Applied Surface Science >The effect of formic acid concentration on the conductivity and corrosion resistance of chromium carbide coatings electroplated with trivalent chromium
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The effect of formic acid concentration on the conductivity and corrosion resistance of chromium carbide coatings electroplated with trivalent chromium

机译:甲酸浓度对三价铬电镀碳化铬涂层电导率和耐蚀性的影响

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摘要

Different concentrations of formic acid were added into a trivalent chromium electroplating solution to produce chromium carbide (Cr-C) coatings. The influence of the formic acid concentration on chemical composition, microstructure, surface morphology, corrosion resistance, conductivity and carbon content of the resulting Cr-C coatings was studied. Formic acid was found to increase the carbon content in the coatings so as to form Cr-C films. These coatings had a nearly amorphous structure containing Cr, Cr_2O_3, and various Cr-C compounds with carbon content uniformly distributed throughout the coatings. The carbon content and the conductivity of the Cr-C layer were correlated with formic acid concentration. For a formic acid concentration of 2 M, the Cr-C layer had the highest carbon content (~28%), the lowest contact resistance, and the best corrosion resistance along with a corrosion current density of ~6.4×10~(-7) A/cm~2.
机译:将不同浓度的甲酸添加到三价铬电镀液中以生产碳化铬(Cr-C)涂层。研究了甲酸浓度对所得Cr-C涂层化学成分,微观结构,表面形态,耐蚀性,电导率和碳含量的影响。发现甲酸会增加涂层中的碳含量,从而形成Cr-C膜。这些涂层具有包含Cr,Cr_2O_3和各种Cr-C化合物的几乎无定形的结构,碳含量均匀地分布在整个涂层中。 Cr-C层的碳含量和电导率与甲酸浓度相关。甲酸浓度为2 M时,Cr-C层的碳含量最高(〜28%),接触电阻最低,耐蚀性最好,腐蚀电流密度约为6.4×10〜(-7 )A / cm〜2。

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  • 来源
    《Applied Surface Science 》 |2013年第1期| 544-551| 共8页
  • 作者单位

    Graduate School of Defense Science, Chung-Cheng Institute of Technology, National Defense University, Dasi, Taoyuan 335, Taiwan;

    Department of Photonics Engineering, Yuan Ze University, Zhongli, Taoyuan 320, Taiwan;

    Department of Power Vehicle and Systems Engineering, Chung-Cheng Institute of Technology, National Defense University, Dasi, Taoyuan 335, Taiwan;

    Medical Device Section, Medical Devices and Opto-Electronics Equipment Department, Metal Industries Research & Development Centre, Kaohsiung 821, Taiwan;

    Department of Chemical and Materials Engineering, Chung Cheng Institute of Technology, National Defense University, Taoyuan 335, Taiwan;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Electroplating; Trivalent chromium; Chromium carbide coating; Conductivity; Corrosion resistance;

    机译:电镀;三价铬碳化铬涂层;电导率耐腐蚀性能;

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