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The investigation of Ni-Al and Co-Al based layered double hydroxides and their derived mixed oxides thin films deposited by pulsed laser deposition

机译:脉冲激光沉积Ni-Al和Co-Al基层状双氢氧化物及其衍生的混合氧化物薄膜的研究

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摘要

Layered Double Hydroxides (LDHs) are host-guest materials consisting of positively charged metal/hydroxides sheets with intercalated anions and water molecules. LDHs can be described by the generic formula [M_(1-x)~(2+)M_x~(3+)(OH)_2]~(x+)[A_x]~(n-)·mH_2O and their structure is formed by layers containing divalent cations (M2+: Mg, Zn, Ni, Co,...) and trivalent cations (M~(3+): Al, Ga, Cr,...) with an octahedral coordination. LDH films with well-oriented structure and controlled thickness are needed for numerous applications like sensors, protective coatings, catalysts, components for optoelectronics etc.In this work, we report on the deposition of Ni-Al and Co-Al based LDHs and their derived mixed oxides by pulsed laser deposition as a new approach to fabricate oriented LDHs or highly dispersed metallic mixed oxides. The influence of the laser characteristics, such as wavelength and fluence, on the films properties was studied. The films investigation techniques were X-Ray Diffraction, Atomic Force Microscopy, Scanning Electron Microscopy combined with energy dispersive X-ray analysis, and Secondary Ions Mass Spectrometry.
机译:层状双氢氧化物(LDHs)是客体材料,由带正电荷的金属/氢氧化物薄片以及嵌入的阴离子和水分子组成。 LDH可以用通式[M_(1-x)〜(2+)M_x〜(3 +)(OH)_2]〜(x +)[A_x / n]〜(n-)·mH_2O来描述由含有二价阳离子(M2 +:Mg,Zn,Ni,Co,...)和三价阳离子(M〜(3 +):Al,Ga,Cr ...)的层形成,这些层具有八面体配位。传感器,保护膜,催化剂,光电元件等众多应用都需要结构良好且厚度可控的LDH膜。在这项工作中,我们报告了Ni-Al和Co-Al基LDH的沉积及其衍生脉冲激光沉积制备混合氧化物,这是制造定向LDH或高度分散的金属混合氧化物的新方法。研究了诸如波长和能量密度等激光特性对薄膜性能的影响。胶片的研究技术是X射线衍射,原子力显微镜,扫描电子显微镜与能量色散X射线分析相结合以及二次离子质谱法。

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  • 来源
    《Applied Surface Science》 |2013年第1期|122-126|共5页
  • 作者单位

    National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Str., 77125 Bucharest-Magurele, Romania;

    National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Str., 77125 Bucharest-Magurele, Romania;

    National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Str., 77125 Bucharest-Magurele, Romania;

    National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Str., 77125 Bucharest-Magurele, Romania;

    National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Str., 77125 Bucharest-Magurele, Romania;

    National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Str., 77125 Bucharest-Magurele, Romania;

    University of Bucharest, Faculty of Chemistry, Department of Chemical Technology and Catalysis, 4-12 Regina Elisabeta Bd., Bucharest, Romania;

    University of Bucharest, Faculty of Chemistry, Department of Chemical Technology and Catalysis, 4-12 Regina Elisabeta Bd., Bucharest, Romania;

    National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Str., 77125 Bucharest-Magurele, Romania;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Layered double hydroxides; Mixed oxides; Thin films; PLD;

    机译:层状双氢氧化物;混合氧化物;薄膜;可编程逻辑器件;

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