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Optimization of synthesis parameters of mesoporous silica sol-gel thin films for application on 2024 aluminum alloy substrates

机译:用于2024铝合金基体的介孔二氧化硅溶胶-凝胶薄膜的合成参数优化。

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摘要

Silica mesoporous films were synthesized via Evaporation Induced Self-Assembly (EISA) using Pluronic P123 as templating agent and were applied on 2024 aluminum alloy for surface treatment applications. The removal of the P123 from the film required to convert the mesostructured film into a mesoporous film was particularly studied and optimized in order to be compatible with the use of an aluminum substrate. In this work, two different kinds of removal treatments were compared: calcination at high temperatures and UV/ozone treatment. Indeed, a minimum temperature of 275 ℃ has to be reached to completely remove the templating agent from the film. However, this treatment also leads to a decrease in mechanical properties of the aluminum substrate. In opposition, the removal by UV/ozone illumination allows getting mesoporous films at room temperature with important pore volume and high specific surface area without impacting mechanical properties of the aluminum. The effect of these treatments on mechanical properties of bare aluminum was followed by microhardness. The development of the porosity inside the film due to the elimination of the P123 was measured by combining analytical techniques (Fourier transform infrared spectroscopy FTIR, radio-frequency glow discharge optical emission spec-troscopy RF-GDOES), electrochemical impedance spectroscopy (EIS) and adsorption porosimetry using a quartz crystal microbalance.
机译:以Pluronic P123为模板剂,通过蒸发诱导自组装(EISA)合成了二氧化硅介孔膜,并在2024铝合金上进行了表面处理。为了与铝基板的使用相容,特别研究并优化了从膜中去除P123以将介孔结构膜转变为介孔膜的方法。在这项工作中,比较了两种不同的去除处理方法:高温煅烧和UV /臭氧处理。实际上,必须达到最低温度275℃才能从薄膜中完全去除模板剂。但是,该处理也导致铝基板的机械性能降低。相反,通过UV /臭氧照射的去除允许在室温下获得具有重要孔体积和高比表面积的中孔膜而不会影响铝的机械性能。这些处理对裸铝的机械性能的影响随后是显微硬度。通过结合分析技术(傅里叶变换红外光谱FTIR,射频辉光放电光发射光谱RF-GDOES),电化学阻抗谱(EIS)和分析技术,测量了由于消除了P123而导致的膜内部孔隙率的发展。使用石英晶体微量天平进行吸附孔隙率法。

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