Roughness scaling in titanium thin films: A three-dimensional molecular dynamics study of rotational and static glancing angle deposition

摘要

Three-dimensional molecular dynamics simulations of the glancing angle deposition of titanium was performed both with and without substrate rotation for different deposition angles (α- 85°, 80°, 55°, and 0°). The surface roughness of the final films, all consisting of 10,000 deposited atoms, was calculated at different length scales of the substrate. The roughness scaling was shown to be, within error, identical for the rotational and static glancing angle deposited thin films.