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Transparent conductive Ga_2O_3/Cu/ITO multilayer films prepared on flexible substrates at room temperature

机译:室温下在柔性基板上制备透明导电Ga_2O_3 / Cu / ITO多层膜

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摘要

Transparent conductive Ga_2O_3/Cu/ITO films were prepared on the polyethylene terephthalate (PET) substrates using radio frequency (RF) and direct current (DC) magnetron sputtering without substrates heating. The effects of Ga_2O_3 layer thickness and Cu layer thickness on the optical and electrical properties of the Ga_2O_3/Cu/ITO films were studied. Changes in the optoelectrical properties of Ga_2O_3/Cu (4.2 nm)/ITO (30 nm) films were investigated with respect to the Ga_2O_3 layer thickness. The maximum transmission of 86%, the sheet resistance of 45 Ω/sq and the figure of merit of 8.89 × 10~(-2) Ω~(-1) were achieved for Ga_2O_3 (15 nm)/Cu (4.2 nm)/ITO (30 nm) films. The optoelectrical properties of the Ga_2O_3/Cu/ITO films were also significantly influenced by the thickness of the Cu layer. When the thickness of Cu layer was 3.7 nm, the maximum transmission of 87.6%, the sheet resistance of 50 Ω/sq and the figure of merit of 9.26 × 10~(-2) Ω~(-1) were obtained for the Ga_2O_3 (15 nm)/Cu/ITO (30 nm) films.
机译:使用射频(RF)和直流(DC)磁控管溅射在不加热基板的情况下,在聚对苯二甲酸乙二醇酯(PET)基板上制备透明导电Ga_2O_3 / Cu / ITO膜。研究了Ga_2O_3层厚度和Cu层厚度对Ga_2O_3 / Cu / ITO膜光学和电学性质的影响。研究了Ga_2O_3 / Cu(4.2 nm)/ ITO(30 nm)膜的光电性能相对于Ga_2O_3层厚度的变化。 Ga_2O_3(15 nm)/ Cu(4.2 nm)/时,最大透射率为86%,薄层电阻为45Ω/ sq,品质因数为8.89×10〜(-2)Ω〜(-1)/ ITO(30 nm)膜。 Ga_2O_3 / Cu / ITO薄膜的光电性能也受到Cu层厚度的显着影响。 Cu层的厚度为3.7nm时,Ga_2O_3的最大透射率为87.6%,薄层电阻为50Ω/ sq,品质因数为9.26×10〜(-2)Ω〜(-1)。 (15 nm)/ Cu / ITO(30 nm)膜。

著录项

  • 来源
    《Applied Surface Science》 |2014年第15期|241-245|共5页
  • 作者单位

    School of Physics and Optoelectronic Engineering, Ludong University, Hongqi Road 186, Yantai 264025, Shandong, People's Republic of China;

    School of Physics and Optoelectronic Engineering, Ludong University, Hongqi Road 186, Yantai 264025, Shandong, People's Republic of China;

    School of Physics and Optoelectronic Engineering, Ludong University, Hongqi Road 186, Yantai 264025, Shandong, People's Republic of China;

    School of Physics and Optoelectronic Engineering, Ludong University, Hongqi Road 186, Yantai 264025, Shandong, People's Republic of China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Indium tin oxide; Copper; Ga_2O_3 buffer layer; Flexible substrate;

    机译:氧化铟锡;铜;Ga_2O_3缓冲层;柔性基板;

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