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Effect of 2,2′-dipyridyl on the plating rate, microstructure and performance of copper-coated tungsten composite powders prepared using electroless plating

机译:2,2'-联吡啶对化学镀铜包覆钨复合粉末的镀覆速率,微观结构和性能的影响

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摘要

Highly pure copper-coated tungsten powders were successfully prepared in fixed quantities using electroless plating, via the addition of an appropriate amount of 2,2′-dipyridyl to the plating bath. The effect of 2,2′-dipyridyl on the plating Cu rate, microstructure and performance of the coated Cu layer was studied systematically. Changing the concentration of 2,2′-dipyridyl had significant effects on the plating Cu rate, surface morphology, average grain size, purity and quantity of coated Cu. With a 2,2′-dipyridyl concentration of approximately 20-40 mg/L, the coated Cu was highly pure, with very little oxygen content (less than 0.1 wt.%). The complexation of the 2,2′-dipyridyl with cuprous ions and the absorption of the 2,2′-dipyridyl on the coated Cu surface can explain these findings. With increase in the concentration of 2,2′-dipyridyl in the plating bath, the plating Cu rate, microstructure and performance of the coated Cu layer changed steadily, indicating that the complexation and absorption of 2,2′-dipyridyl gradually approached a saturation level. High thermal performance W-Cu composite can be fabricated by using these composite powders.
机译:通过向镀浴中添加适量的2,2'-联吡啶,通过化学镀成功地以固定的量成功制备了高纯度的铜包覆钨粉。系统研究了2,2'-联吡啶对镀铜速率,镀层微观结构和性能的影响。改变2,2'-联吡啶的浓度对镀铜速率,表面形貌,平均晶粒尺寸,纯度和被覆铜量具有重要影响。当2,2'-联吡啶的浓度约为20-40 mg / L时,包覆的铜是高纯的,几乎没有氧含量(小于0.1 wt。%)。 2,2'-联吡啶与亚铜离子的络合以及2,2'-联吡啶在被覆铜表面的吸收可以解释这些发现。随着镀液中2,2'-联吡啶的浓度的增加,镀铜速率,涂层铜层的微观结构和性能稳定变化,表明2,2'-联吡啶的络合和吸收逐渐达到饱和。水平。通过使用这些复合粉末,可以制造出高热性能的W-Cu复合材料。

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  • 来源
    《Applied Surface Science》 |2014年第15期|85-90|共6页
  • 作者单位

    State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, PR China;

    State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, PR China;

    State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, PR China;

    State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, PR China;

    State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, PR China;

    State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, PR China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    W-Cu; Electroless plating Cu; 2,2′-Dipyridyl; Plating Cu rate; Microstructure; Performance;

    机译:钨铜化学镀铜;2,2'-联吡啶;分期电镀;微观结构性能;

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