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机译:功耗对纳米结构类金刚石碳薄膜结构和纳米力学性能的影响
Plasma Processed Materials Group, CSIR-National Physical Laboratory, Dr. K.S. Krishnan Road, New Delhi 110012, India ,Department of Physics, Indian Institute of Technology Delhi, New Delhi 110016, India ,Department of Electrical and Computer Engineering, National University of Singapore, Singapore, Singapore;
Plasma Processed Materials Group, CSIR-National Physical Laboratory, Dr. K.S. Krishnan Road, New Delhi 110012, India;
Plasma Processed Materials Group, CSIR-National Physical Laboratory, Dr. K.S. Krishnan Road, New Delhi 110012, India;
Department of Physics, Indian Institute of Technology Delhi, New Delhi 110016, India;
Plasma deposition; Ⅵ probe; XPS; Nanoindentation; DLC;
机译:纳米结构类金刚石碳薄膜的结构和纳米力学性能
机译:纳米结构类金刚石碳薄膜的结构和纳米机械性能
机译:射频功率对射频磁控溅射沉积纳米结构氮化碳薄膜电学和力学性能的影响
机译:沉积在铜基底上的类金刚石碳膜的生长和纳米力学性能
机译:碳和铋薄膜的超薄膜的电子,振动和结构特性。
机译:沉积在纺织品上的类金刚石碳/银纳米复合薄膜的抗菌性能:迈向智能绷带
机译:银的掺入对类金刚石碳薄膜结构和电性能的影响