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Influence of consumed power on structural and nano-mechanical properties of nano-structured diamond-like carbon thin films

机译:功耗对纳米结构类金刚石碳薄膜结构和纳米力学性能的影响

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摘要

Mixed Ar-C_2H_2 plasma was characterized by VI probe for estimating the actual consumed power (CP) in the plasma and its effect on diamond-like carbon (DLC) thin films deposited at different CPs in the range 16-85 W. The structural properties of the films were examined using variety of spectroscopic and microscopic techniques, such as Fourier Transform Infrared spectroscopy, X-ray Photoelectron Spectroscopy, Micro-Raman Spectroscopy and Atomic Force Microscopy. The film deposited at 36 W CP showed the formation of nano-structure, creation of optimum sp~3/sp~2 bonding ratio and excellent nano-mechanical properties with the maximum hardness of ~28.2GPa. However, the nano-mechanical properties of the films got altered with the variation of CP, which is attributed to the changes seen in the structural properties. These findings show that high quality DLC films with higher hardness can be deposited by monitoring and controlling the process parameters of the plasma.
机译:VI探针对混合的Ar-C_2H_2等离子体进行了表征,以估计等离子体中的实际消耗功率(CP)及其对沉积在16-85 W范围内不同CP的类金刚石碳(DLC)薄膜的影响。结构特性使用多种光谱和显微技术,例如傅立叶变换红外光谱,X射线光电子能谱,显微拉曼光谱和原子力显微镜,检查了其中的膜。在36 W CP下沉积的薄膜显示出纳米结构的形成,形成了最佳的sp〜3 / sp〜2键合比和优异的纳米机械性能,最大硬度约为28.2GPa。然而,薄膜的纳米力学性能随CP的变化而改变,这归因于结构性能的变化。这些发现表明,可以通过监测和控制等离子体的工艺参数来沉积具有更高硬度的高质量DLC膜。

著录项

  • 来源
    《Applied Surface Science》 |2014年第1期|141-148|共8页
  • 作者单位

    Plasma Processed Materials Group, CSIR-National Physical Laboratory, Dr. K.S. Krishnan Road, New Delhi 110012, India ,Department of Physics, Indian Institute of Technology Delhi, New Delhi 110016, India ,Department of Electrical and Computer Engineering, National University of Singapore, Singapore, Singapore;

    Plasma Processed Materials Group, CSIR-National Physical Laboratory, Dr. K.S. Krishnan Road, New Delhi 110012, India;

    Plasma Processed Materials Group, CSIR-National Physical Laboratory, Dr. K.S. Krishnan Road, New Delhi 110012, India;

    Department of Physics, Indian Institute of Technology Delhi, New Delhi 110016, India;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Plasma deposition; Ⅵ probe; XPS; Nanoindentation; DLC;

    机译:等离子体沉积;Ⅵ探针;XPS;纳米压痕DLC;

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