CARBON OXIDE THIN FILM, CARBON OXYNITRIDE THIN FILM AND DIAMOND-LIKE CARBON OXIDE THIN FILM AND METHOD FOR MANUFACTURING THESE CARBON OXIDE TYPE THIN FILMS

摘要

PROBLEM TO BE SOLVED: To provide a new carbon oxide thin film, a new carbon oxynitride thin film and a new diamond-like carbon oxide thin film stable even in wet atmosphere and excellent in adhesive property to a substrate and suitability to microfabrication such as electron beam lithography and to provide a method for manufacturing those.;SOLUTION: The carbon oxide thin film, the carbon oxynitride thin film and the diamond-like carbon oxide thin film are manufactured by plasma-decomposing gaseous starting materials including CO in an inert gaseous atmosphere, sputtering a carbonaceous material with at least part of ions in the generated plasma-forming components, and depositing the reaction product of at least part of the plasma-forming components and sputtered carbon atoms on a substrate.;COPYRIGHT: (C)2004,JPO