Growth and nano-mechanical properties of diamond-like carbon films deposited on copper substrate

摘要

In this paper, Diamond-like carbon films were deposited on copper substrate by combining plasma enhanced unbalance magnetron sputtering physical vapor deposition (PEUMS-PVD) and microwave electron cyclotron resonance plasma enhanced chemical vapor deposition (MW-ECRPECVD) techniques. The nano-mechanical behaviours and structure of the DLC films were investigated by Raman spectroscopy, nano-indentation, and the film structural morphology by Atomic force microscopy (AFM). Raman spectroscopy indicated that the films show amorphous structure and typical characteristic of DLC film.Nano-indentation measures showed that the hardness (H) and the elastic modulus (E) had a peak value at the substrate negative self-bias voltage of 100V. The outcome of observation through AFM indicated that the films were dense and homogeneous. The obtained results showed that the DLC films deposited at 100V provided the best results, presenting a high adherence with substrates, a high hardness, and a steady and smooth surface.