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Fabrication of superhydrophobic and highly oleophobic silicon-based surfaces via electroless etching method

机译:通过化学腐蚀方法制备超疏水和高疏油性硅基表面

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摘要

This study reports on a simple method for the preparation of superhydrophobic and highly oleophobic nanostructured silicon surfaces. The technique relies on metal-assisted electroless etching of silicon in sodium tetrafluoroborate (NaBF_4) aqueous solution. Then, silver particles were deposited on the obtained surfaces, changing their overall physical morphology. Finally, the surfaces were coated by either C_4F_8, a fluoropolymer deposited by plasma, or by SiO_x overlayers chemically modified with 1H,1H,2H,2H-perfluorodecyltrichlorosilane (PFTS) through silanization reaction. All these surfaces exhibit a superhydrophobic character (large apparent contact angle and low hysteresis with respect to water). In addition, they present high oleophobic properties, i.e. a high repellency to low surface energy liquids with various contact angle hysteresis, both depending on the morphology and type of coating.
机译:该研究报告了一种制备超疏水和高疏油纳米结构硅表面的简单方法。该技术依赖于四氟硼酸钠(NaBF_4)水溶液中金属的化学辅助硅蚀刻。然后,银颗粒沉积在获得的表面上,从而改变了它们的整体物理形态。最后,用C_4F_8(一种通过等离子体沉积的含氟聚合物)或通过硅烷化反应用1H,1H,2H,2H-全氟癸基三氯硅烷(PFTS)化学修饰的SiO_x覆盖层涂覆表面。所有这些表面均表现出超疏水特性(相对于水的表观接触角大且滞后性低)。另外,它们具有高的疏油性,即对具有各种接触角滞后的低表面能液体具有高的排斥性,这取决于涂层的形态和类型。

著录项

  • 来源
    《Applied Surface Science》 |2014年第15期|38-43|共6页
  • 作者单位

    Institut de Recherche Interdisciplinaire (IRI, CNRS-USR 3078), Universite Lille 1, Pare de la Haute Borne, 50 Avenue de Halley, BP70478, 59658 Villeneuve d'Ascq, France,Institut d'Electronique, de Microelectronique et de Nanotechnologie (IEMN, CNRS-UMR 8520), Universite Lillet, Cite Scientifique, Avenue Poincare, BP 60069, 59652 Villeneuve d'Ascq, France,PetroVietnam University (PVU), 6th floor, 30/4 Street, Vung Tau, Vietnam;

    Institut d'Electronique, de Microelectronique et de Nanotechnologie (IEMN, CNRS-UMR 8520), Universite Lillet, Cite Scientifique, Avenue Poincare, BP 60069, 59652 Villeneuve d'Ascq, France,Max Planck Institute for Dynamics and Self-Organization, Am Fassberg 17,37077 Coettingen, Germany;

    Institut d'Electronique, de Microelectronique et de Nanotechnologie (IEMN, CNRS-UMR 8520), Universite Lillet, Cite Scientifique, Avenue Poincare, BP 60069, 59652 Villeneuve d'Ascq, France;

    Institut d'Electronique, de Microelectronique et de Nanotechnologie (IEMN, CNRS-UMR 8520), Universite Lillet, Cite Scientifique, Avenue Poincare, BP 60069, 59652 Villeneuve d'Ascq, France;

    Institut de Recherche Interdisciplinaire (IRI, CNRS-USR 3078), Universite Lille 1, Pare de la Haute Borne, 50 Avenue de Halley, BP70478, 59658 Villeneuve d'Ascq, France;

    Institut de Recherche Interdisciplinaire (IRI, CNRS-USR 3078), Universite Lille 1, Pare de la Haute Borne, 50 Avenue de Halley, BP70478, 59658 Villeneuve d'Ascq, France;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Silicon nanostructures; Superhydrophobic surfaces; Highly oleophobic surfaces; Non-wetting properties;

    机译:硅纳米结构;超疏水表面;高度疏油表面;非润湿性;

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