Inhibition of copper corrosion by the formation of Schiff base self-assembled monolayers

摘要

Self-assembled monolayers (SAMs) of 4-((2-thiophenecarboxylic acid hydrazide) methylene) benzoic acid (HD2) (denoted as HD2-SAMs) were formed on copper surface. The SAMs were characterized by scanning electron microscopy and X-ray photoelectron spectroscopy. Polarization curve and weight loss methods indicated that the highest inhibition efficiency was 93.9% for CO2-saturated simulative oilfield water at a self-assembled time of 3 h. Potential-time curve, electrochemical impedance tests showed that HD2-SAMs on copper surface exhibited excellent inhibition effect at 30 degrees C. The adsorption behavior of HD2-SAMs on the copper surface followed the Langmuir adsorption isotherm, which was indicative of typically chemical adsorption. Quantum chemistry calculation showed that O and N atoms can interact with Cu atoms by coordination bonds which were the mainly active area of the adsorption of HD2 molecules. (C) 2016 Elsevier B.V. All rights reserved.