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Tungsten nitride coatings obtained by HiPIMS as plasma facing materials for fusion applications

机译:由HiPIMS获得的氮化钨涂层,用作熔融应用的面向等离子体的材料

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In this work, tungsten nitride coatings with nitrogen content in the range of 19-50 at% were prepared by reactive multi-pulse high power impulse magnetron sputtering as a function of the argon and nitrogen mixture and further exposed to a deuterium plasma jet. The elemental composition, morphological properties and physical structure of the samples were investigated by Rutherford backscattering spectrometry, atomic force microscopy and X-ray diffraction. Deuterium implantation was performed using a deuterium plasma jet and its retention in nitrogen containing tungsten films was investigated using thermal desorption spectrometry. Deuterium retention and release behaviour strongly depend on the nitrogen content in the coatings and the films microstructure. All nitride coatings have a polycrystalline structure and retain a lower deuterium level than the pure tungsten sample. Nitrogen content in the films acts as a diffusion barrier for deuterium and leads to a higher desorption temperature, therefore to a higher binding energy. (C) 2017 Elsevier B.V. All rights reserved.
机译:在这项工作中,通过反应性多脉冲高功率脉冲磁控溅射作为氩气和氮气混合物的功能,制备了氮含量在19-50 at%范围内的氮化钨涂层,并进一步暴露于氘等离子体射流。通过卢瑟福反向散射光谱,原子力显微镜和X射线衍射研究了样品的元素组成,形态特征和物理结构。使用氘等离子射流进行氘注入,并使用热解吸光谱法研究其在含氮钨膜中的保留。氘的保留和释放行为在很大程度上取决于涂层和膜微结构中的氮含量。所有氮化物涂层均具有多晶结构,并且氘的含量低于纯钨样品。膜中的氮含量充当氘的扩散屏障,并导致更高的解吸温度,因此导致更高的结合能。 (C)2017 Elsevier B.V.保留所有权利。

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