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Step-height standards based on the rapid formation of monolayer steps on the surface of layered crystals

机译:基于在层状晶体表面快速形成单层台阶的台阶高度标准

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Metrology is essential for nanotechnology, especially for structures and devices with feature sizes going down to nm. Scanning probe microscopes (SPMs) permits measurement of nanometer- and subnanometer-scale objects. Accuracy of size measurements performed using SPMs is largely defined by the accuracy of used calibration measures. In the present publication, we demonstrate that height standards of monolayer step (similar to 1 and similar to 0.6 nm) can be easily prepared by cleaving Bi2Se3 and ZnWO4 layered single crystals. It was shown that the conducting surface of Bi2Se3 crystals offers height standard appropriate for calibrating STMs and for testing conductive SPM probes. Our AFM study of the morphology of freshly cleaved (0001) Bi2Se3 surfaces proved that such surfaces remained atomically smooth during a period of at least half a year. The (010) surfaces of ZnWO4 crystals remained atomically smooth during one day, but already two days later an additional nanorelief of amplitude similar to 0.3 nm appeared on those surfaces. This relief, however, did not further grow in height, and it did not hamper the calibration. Simplicity and the possibility of rapid fabrication of the step-height standards, as well as their high stability, make these standards available for a great, permanently growing number of users involved in 3D printing activities. (C) 2017 Elsevier B.V. All rights reserved.
机译:计量对于纳米技术至关重要,特别是对于特征尺寸降至纳米的结构和设备。扫描探针显微镜(SPM)可以测量纳米级和亚纳米级的物体。使用SPM进行尺寸测量的准确性很大程度上取决于所使用的校准措施的准确性。在本出版物中,我们证明了通过裂解Bi2Se3和ZnWO4层状单晶可以很容易地制备单层台阶的高度标准(类似于1和类似的0.6 nm)。结果表明,Bi2Se3晶体的导电表面提供了适用于校准STM和测试导电SPM探针的高度标准。我们对新鲜切割的(0001)Bi2Se3表面的形态进行的AFM研究证明,这种表面在至少半年的时间内仍保持原子光滑。 ZnWO4晶体的(010)表面在一天之内保持原子光滑,但是已经过了两天,在这些表面上出现了另一幅类似于0.3 nm的纳米浮雕。但是,此凸起的高度并没有进一步增加,也没有妨碍校准。高度步进标准的简单性和快速制造的可能性以及其高稳定性,使得这些标准可用于参与3D打印活动的大量且不断增长的用户。 (C)2017 Elsevier B.V.保留所有权利。

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