首页> 外文期刊>Applied Surface Science >Atomic nature of the Schottky barrier height formation of the Ag/GaAs(001)-2 x 4 interface: An in-situ synchrotron radiation photoemission study
【24h】

Atomic nature of the Schottky barrier height formation of the Ag/GaAs(001)-2 x 4 interface: An in-situ synchrotron radiation photoemission study

机译:Ag / GaAs(001)-2 x 4界面肖特基势垒高度形成的原子性质:原位同步加速器辐射光发射研究

获取原文
获取原文并翻译 | 示例

摘要

The Interface of Ag with p-type 2 GaAs(001)-2 x 4 has been studied to further understand the formation mechanism of the Schottky barrier height (SBH). In the initial phase of Ag deposition, high-resolution core-level data show that Ag adatoms effectively passivate the surface As-As dimers without breaking them apart. The Ag(+)-As(-) dipoles are thus generated with a maximal potential energy of 0.26 eV; a SBH of 0.38 eV was measured. Greater Ag coverage causes elemental segregation of As/Ga atoms, reversing the direction of the net dipole. The band bending effect near the interface shows a downward shift of 0.08 eV, and the final SBH is similar to the value as measured at the initial Ag deposition. Both parameters are secured at 0.25 A of Ag thickness prior to the observation of metallic behavior of Ag. Inadequacy of the metal-induced gap-state model for explaining SBH is evident. (C) 2016 Elsevier B.V. All rights reserved.
机译:研究了Ag与p型2 GaAs(001)-2 x 4的界面,以进一步了解肖特基势垒高度(SBH)的形成机理。在Ag沉积的初始阶段,高分辨率核心层数据显示,Ag吸附原子可有效钝化表面As-As二聚体而不会将它们分开。这样就产生了最大势能为0.26 eV的Ag(+)-As(-)偶极子。测得的SBH为0.38 eV。 Ag覆盖率更高会导致As / Ga原子的元素偏析,从而逆转净偶极子的方向。界面附近的能带弯曲效应显示出0.08 eV的向下偏移,最终的SBH类似于在初始Ag沉积时测得的值。在观察Ag的金属行为之前,将这两个参数固定在0.25 A的Ag厚度下。金属诱导的间隙状态模型不足以解释SBH是显而易见的。 (C)2016 Elsevier B.V.保留所有权利。

著录项

  • 来源
    《Applied Surface Science》 |2017年第30期|294-298|共5页
  • 作者单位

    Natl Chiayi Univ, Dept Electrophys, Chiayi 60004, Taiwan;

    Natl Chiayi Univ, Dept Electrophys, Chiayi 60004, Taiwan|Natl Synchrotron Radiat Res Ctr, Hsinchu 30076, Taiwan;

    Natl Taiwan Univ, Grad Inst Appl Phys, Taipei 10617, Taiwan|Natl Taiwan Univ, Dept Phys, Taipei 10617, Taiwan;

    Natl Chiayi Univ, Dept Electrophys, Chiayi 60004, Taiwan;

    Natl Chiayi Univ, Dept Electrophys, Chiayi 60004, Taiwan;

    Natl Taiwan Univ, Grad Inst Appl Phys, Taipei 10617, Taiwan|Natl Taiwan Univ, Dept Phys, Taipei 10617, Taiwan;

    Natl Taiwan Univ, Grad Inst Appl Phys, Taipei 10617, Taiwan|Natl Taiwan Univ, Dept Phys, Taipei 10617, Taiwan;

    Natl Synchrotron Radiat Res Ctr, Hsinchu 30076, Taiwan;

    CUNY Brooklyn Coll, Dept Phys, Brooklyn, NY 11210 USA;

    Natl Thing Hua Univ, Dept Phys, Hsinchu 30013, Taiwan;

    Natl Taiwan Univ, Grad Inst Appl Phys, Taipei 10617, Taiwan|Natl Taiwan Univ, Dept Phys, Taipei 10617, Taiwan;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Schottky barrier height; III-V semiconductor; Synchrotron radiation photoemission;

    机译:肖特基势垒高度;III-V族半导体;同步加速器辐射光发射;

相似文献

  • 外文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号