首页> 外文期刊>Applied Physics >X-ray emission as a potential hazard during ultrashort pulse laser material processing
【24h】

X-ray emission as a potential hazard during ultrashort pulse laser material processing

机译:X射线发射是超短脉冲激光材料加工过程中的潜在危害

获取原文
获取原文并翻译 | 示例

摘要

In laser machining with ultrashort laser pulses unwanted X-ray radiation in the keV range can be generated when a critical laser intensity is exceeded. Even if the emitted X-ray dose per pulse is low, high laser repetition rates can lead to an accumulation of X-ray doses beyond exposure safety limits. For 925 fs pulse duration at a center wavelength of 1030 nm, the X-ray emission was investigated up to an intensity of 2.6 x 10(14) W/cm(2). The experiments were performed in air with a thin disk laser at a repetition rate of 400 kHz. X-ray spectra and doses were measured for various planar target materials covering a wide range of the periodic table from aluminum to tungsten. Without radiation shielding, the measured radiation doses at this high repetition rate clearly exceed the regulatory limits. Estimations for an adequate radiation shielding are provided.
机译:在超短激光脉冲的激光加工中,当超过临界激光强度时,会产生keV范围内的有害X射线辐射。即使每个脉冲发出的X射线剂量很低,高的激光重复率也会导致X射线剂量的累积超过暴露安全极限。对于中心波长为1030 nm的925 fs脉冲持续时间,研究了X射线发射,强度高达2.6 x 10(14)W / cm(2)。实验是在空气中用薄盘激光器以400 kHz的重复频率进行的。测量了涵盖从铝到钨的各种元素周期表的各种平面目标材料的X射线光谱和剂量。在没有辐射屏蔽的情况下,在这种高重复率下测得的辐射剂量明显超过了法规极限。提供了足够的辐射屏蔽估计。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号