Structural and compositional analyses of nanocrystalline diamond/β-SiC composite films

摘要

Nanocrystalline diamond/β-SiC composite films are synthesized by microwave plasma chemical vapor deposition using a gas mixture of H_2, CH4, and tetramethylsilane (Si(CH_3)_4, TMS) in a single process step. Structural and compositional analyses revealed that the films consist of a mixture of diamond and β-SiC nanocrystalline phases in a desired volume fraction combinatorial form. Transmission electron microscopy analysis confirmed the X-ray diffraction results and showed that the major diffraction lines corresponded to a two-component nanocrystalline composite film. Infrared spectroscopic analysis showed that the content of β-SiC in the films can be increased by increasing the TMS concentration. This correlated very well with electron probe microanalysis and Rutherford backscatter-ing analysis that showed an almost linear correspondence of Pβ-SiC content in the films with the TMS concentration in the gas phase. The phase purity of the diamond crystallites decreased with increase in the β-SiC content in the films, as shown by micro Raman scattering studies. Smooth surface morphologies are measured for these films by using atomic force microscopy; the root mean square roughness was 12 ± 1 nm. The β-SiC volume fraction (vol. %) was identified as an important compositional factor to determine any mechanical and frictional properties of these films.