机译:电化学刻蚀制备的多孔GaP的形貌表征
Department of Materials Science and Engineering, National Cheng Kung University, Tainan 701, Taiwan;
Department of Materials Science and Engineering, National Cheng Kung University, Tainan 701, Taiwan;
Department of Materials Science, National University of Tainan, Tainan 700, Taiwan;
Department of Mechanical Engineering, National Pingtung University of Science and Technology, Pingtung 912, Taiwan;
Ⅲ-Ⅴ semiconductors; superlattices; porous materials; scanning electron microscopy (SEM) (including EBIC);
机译:电化学刻蚀制备的多孔GaP的形貌表征
机译:电化学阳极刻蚀法制备多孔硅的形貌和纳米结构特征与电解质组成的关系
机译:在不同刻蚀时间下通过电化学刻蚀制备的纳米结构多孔硅的表面和整体结构性质
机译:刻蚀时间对电势电化学刻蚀形成的多孔硅结构形貌的影响
机译:光电化学刻蚀制备的柱状多孔碳化硅的形成与表征。
机译:电化学刻蚀制备多孔硅的形貌和纳米结构特征
机译:刻蚀时间对光电化学法制备N型多孔硅光学和形貌特征的影响