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Single-shot ablation threshold of chromium using UV femtosecond laser pulses

机译:紫外飞秒激光脉冲对铬的单次烧蚀阈值

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摘要

Single-shot ablation threshold for thin chromium film was studied using 266 nm, femtosecond laser pulses. Chromium is a useful material in the nanotech-nology industry and information on ablation threshold using UV femtosecond pulses would help in precise mi-cromachining of the material. The ablation threshold was determined by measuring the ablation crater diameters as a function of incident laser pulse energy. Absorption of 266 nm light on the chromium film was also measured under our experimental conditions, and the absorbed energy single-shot ablation threshold fluence was 46 ± 5 mJ/cm~2. The experimental ablation threshold fluence value was compared to time-dependent heat flow calculations based on the two temperature model for ultrafast laser pulses. The model predicts a value of 31.6 mJ/cm~2 which is qualitatively consistent with the experimentally obtained value, given the simplicity of the model.
机译:使用266 nm飞秒激光脉冲研究了铬薄膜的单脉冲烧蚀阈值。铬是纳米技术行业中有用的材料,使用紫外线飞秒脉冲的烧蚀阈值信息将有助于材料的精确微加工。通过测量作为入射激光脉冲能量的函数的烧蚀坑口直径来确定烧蚀阈值。在我们的实验条件下,还测量了铬膜上266 nm光的吸收,吸收能量的单次烧蚀阈值通量为46±5 mJ / cm〜2。将实验消融阈值注量值与基于时间的热流计算(基于两个温度模型)进行了比较,以得出超快激光脉冲。在模型简单的情况下,该模型预测的值为31.6 mJ / cm〜2,与实验获得的值在质量上一致。

著录项

  • 来源
    《Applied Physics》 |2014年第3期|1473-1478|共6页
  • 作者

    S. P. Banerjee; R. Fedosejevs;

  • 作者单位

    Department of Electrical and Computer Engineering, University of Alberta, Edmonton, AB T6G2V4, Canada;

    Department of Electrical and Computer Engineering, University of Alberta, Edmonton, AB T6G2V4, Canada;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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