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Enhancement of device performance by using quaternary capping over ternary capping in strain-coupled InAs/GaAs quantum dot infrared photodetectors

机译:通过在应变耦合InAs / GaAs量子点红外光电探测器中使用四级帽盖而不是三级帽盖来增强器件性能

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摘要

We investigate and compare the performance of 30 layers strain-coupled quantum dot (SCQD) infrared photodetectors capped with one of two different layers: a quaternary (In_(0.21)Al_(0.21)Ga_(0.58)As) or ternary (In_(0.15)Ga_(0.85)As) alloy of 30 A and a GaAs layer with a thickness of 120-150 A. Measurements of optical properties, spectral responsivity, and cross-sectional transmission electron microscopy were conducted. Results showed that quaternary capping yielded more superior multilayer QD infrared photodetectors than ternary capping. Quaternary capping resulted in enhanced dot size, order, and uniformity of the QD array. The presence of Al in the capped layer helped in the reduction in dark current density and spectral linewidth as well as led to higher electron confinement of the QDs and enhanced device detectivity. The vertically ordered SCQD system with quaternary capping exhibited higher peak detectivity (~10~(10) cm Hz~(1/2)/W) than that with ternary capping (~ 10~7 cm Hz~(1/2)/W). In addition, a very low noise current density of ~ 10~(-16) A/cm~2 Hz~(1-2) at 77 K was achieved with quaternary-capped QDs.
机译:我们调查并比较了30层应变耦合量子点(SCQD)红外光电探测器的性能,该探测器具有两个不同层之一:四元(In_(0.21)Al_(0.21)Ga_(0.58)As)或三元(In_(0.15 30 A)(Ga_(0.85)As)合金和厚度为120-150 A的GaAs层。进行了光学性能,光谱响应率和截面透射电子显微镜的测量。结果表明,与三元封端相比,四元封端可产生更优异的多层QD红外光电探测器。第四级封端导致QD阵列的点大小,顺序和均匀性增强。盖层中铝的存在有助于降低暗电流密度和光谱线宽,并导致量子点的电子限制更高,并提高了器件的探测性。具有四级封盖的垂直排列SCQD系统显示出的峰值检测灵敏度(〜10〜(10)cm Hz〜(1/2)/ W)高于具有三级封盖的系统(〜10〜7 cm Hz〜(1/2)/ W) )。此外,使用四级封顶的量子点在77 K时获得了非常低的噪声电流密度,约为10〜(-16)A / cm〜2 Hz〜(1-2)。

著录项

  • 来源
    《Applied Physics》 |2015年第2期|511-517|共7页
  • 作者单位

    Department of Electrical Engineering, Indian Institute of Technology Bombay, Powai, Mumbai 400076, Maharashtra, India;

    Department of Electrical Engineering, Indian Institute of Technology Bombay, Powai, Mumbai 400076, Maharashtra, India;

    Department of Electrical Engineering, Indian Institute of Technology Bombay, Powai, Mumbai 400076, Maharashtra, India;

    Department of Electrical Engineering, Indian Institute of Technology Bombay, Powai, Mumbai 400076, Maharashtra, India;

    Department of Electrical Engineering, Indian Institute of Technology Bombay, Powai, Mumbai 400076, Maharashtra, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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